晶态氮化碳薄膜的低温合成
Synthesis of Crystalline Carbon Nitride Films at Low Temperature
作者单位
马志斌 武汉化工学院材料科学与工程学院湖北省等离子体化学与新材料重点实验室武汉430073 
汪建华 武汉化工学院材料科学与工程学院湖北省等离子体化学与新材料重点实验室武汉430073 
万 军 武汉化工学院材料科学与工程学院湖北省等离子体化学与新材料重点实验室武汉430073 
黄杨风 武汉化工学院材料科学与工程学院湖北省等离子体化学与新材料重点实验室武汉430073 
摘要: 
关键词: 脉冲电弧放电 氮化碳 甲醇
基金项目: 
Abstract: The synthesis of carbon nitride films at low temperature has been investigated using pulsed arc discharge from methanol solution with nitrogen atmosphere. Raman spectra and X-ray diffraction (XRD) analysis suggest that crystalline carbon nitride films may be prepared at low substrate temperature (220 ℃). At same time, the substrate temperature has a significantly effect on the nitrogen content and structure of the films. Increasing substrate temperature (300 ℃) would decrease the content of nitrogen in the films and result in a formation of carbon films.
Keywords: pulsed arc discharge carbon nitride methanol
 
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马志斌,汪建华,万 军,黄杨风.晶态氮化碳薄膜的低温合成[J].无机化学学报,2004,20(3):349-352.
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