| NH4F对化学镀镍液的作用机理及镀层性能的影响 |
| Effects of NH4F on Electroless Ni-P Plating Bath and Properties of Coatings |
|
| 摘要: |
| 关键词: 氟化铵 化学镀镍磷 缓冲能力 镀层性能 |
| 基金项目: |
| Abstract: The deposition rate and buffering capability of electroless Ni-P plating were studied by ammonium fluoride addition. SEM images show that the coating surface is finer when ammonium fluoride is added in the bath. The electrochemical measurements show that the corrosion resistance of the Ni-P coatings from the bath with ammonium fluoride is greatly improved. EDS shows that the distribution of phosphorus of the coating from the bath with ammonium fluoride is much more uniform than the coating from the original bath, and the surface microhardness is also improved. Ammonium fluoride is proved to be an excellent buffering agent. |
| Keywords: ammonium fluoride electroless Ni-P plating capability of buffering properties of coatings |
| |
| 摘要点击次数: 1211 |
| 全文下载次数: 1555 |
| 应华根,罗伟,严密.NH4F对化学镀镍液的作用机理及镀层性能的影响[J].无机化学学报,2007,23(2):295-299. |
| 查看全文 查看/发表评论 下载PDF阅读器 |
| Support information: |
|
|
|
|
|
|
