等离子辅助制备单元层厚度的铁电薄层及其铁电性的表征 |
Plasma-Assisted Fabrication of Ferroelectric Flakes with Single-Unit-Cell Thickness and Characterization of Ferroelectricity |
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摘要: 我们报道了一种通过机械剥离和Ar+等离子体减薄过程的组合来制备3.6 nm厚的二维双(苄基铵)四氯化铅(A2PbCl4)的薄层。压电力显微镜测量表明,Ar+等离子体蚀刻后单元层厚度的BA2PbCl4薄层的铁电性仍然保持。 |
关键词: BA2PbCl4薄层 铁电性 氩等离子体刻蚀 |
基金项目: 国家自然科学基金(No.21925502)资助。 |
Abstract: Here, we report a successful method to fabricate a 2D bis(benzylammonium) lead tetrachloride (A2PbCl4) flake with a thickness of 3.6 nm by a combination of mechanical exfoliation and an Ar+ plasma thinning process. Piezoresponse force microscopy (PFM) measurements reveal that the ferroelectricity of the A2PbCl4 flakes with single-unit-cell thickness persists after Ar+ plasma etching. |
Keywords: A2PbCl4 flakes ferroelectricity Ar+ Plasma etching |
投稿时间:2020-03-09 修订日期:2020-04-13 |
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葛静,宋贤江,杜国威,李浩杰,游雨蒙.等离子辅助制备单元层厚度的铁电薄层及其铁电性的表征[J].无机化学学报,2020,36(6):1163-1168. |
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